List of Published Papers

• Takeo Nakano, Chieko Murata and Shigeru Baba
  "Effect of the target bias voltage during off-pulse period on the impulse magnetron sputtering" Vacuum, 84 1368-1371 (2010)
• Takeo Nakano, Ken'ichiroh Hoshi and Shigeru Baba
  "Effect of background gas environment on oxygen incorporation in TiN films deposited using UHV reactive magnetron sputtering "
  Vacuum 83 467-469 (2008)
• Takeo Nakano, Ken'ichiroh Hoshi, Shigeru Baba
  "Effect of background vacuum environment on the reactive sputtering deposition of titanium nitrides"
  Sinku 50 291-293 (2007) [in Japanese]
• Takeo Nakano
  "Recent progress in researches on sputter deposition process"
  Sinku, 50 3-8 (2007) [review in Japanese]
• Takeo Nakano, Takashi Fujimoto, Daisuke Nakada and Shigeru Baba
  "Dielectric Breakdown Phenomena during Secondary Electron Emission Measurement of Sputter-Deposited MgO Films"
  Jpn. J. Appl. Phys. 45(10A) 7875-7878 (2006)
• Takeo Nakano and Shigeru Baba
  "Gas pressure effects on thickness uniformity and circumvented deposition during sputter deposition process"
  Vacuum 80(7) 647-649 (2006)
• Yasuo Iiumra, Kazuhiro Takushima, Takeo Nakano and Shigeru Baba
  "Stoichiometry control of silicon oxide films by the reactive sputter deposition with constant power operation"
  Sinku, 49 171-173 (2006) [in Japanese]
• Shigeru Baba, Yoshihiro Yamaguchi, Masashi Ogawa and Takeo Nakano
  "Two critical events observed on Cu films on glass substrate in the microscratch test" in "Adhesion Aspects of Thin Films, Vol. 2" ed. K. L. Mittal, pp. 203-213, VSP (Netherland) 2005
• Takeo Nakano, Hiroshi Mizuhashi and Shigeru Baba
  "Transition of Roughness Evolution in Cu-In Alloy Films by the Formation of Intermetallic Compounds"
  Jpn. J. Appl. Phys. 44(4A) 1932-1938 (2005)
• Shogo Sato, Takeo Nakano and Shigeru Baba
  "Structure and its evolution on In island films on Si substrates revealed in their depth-profiles of X-ray Photoelectron Spectroscopy"
  Sinku, 48(3) 121-123 (2005) [in Japanese]
• Takeo Nakano, Kouji Tanaka and Shigeru Baba
  "Computed Tomography imaging of optical emission from copper sputter deposition plasma: evaluation of the atomic density using the self-absorption effect"
  Vacuum, 74(3-4) 387-390 (2004)
• Takeo Nakano, Shogo Sato and Shigeru Baba
  "Structural analysis of Cu-In alloy films with XPS depth profiling by ion etching"
  Vacuum, 74(3-4) 591-594 (2004)
• Takeo Nakano, Takashi Fujimoto and Shigeru Baba
  "Measurement of surface roughness and ion-induced secondary electron emission coefficient of MgO films prepared by high pressure sputter deposition"
  Vacuum, 74(3-4) 595-599 (2004)
• Kouji Tanaka, Takeo Nakano and Shigeru Baba
  "Evaluation of the sputtered copper atomic density and its dependence on Target-Substrate distance by spatially resolved optical emission spectroscopy"
  Sinku, 47(3) 277-280 (2004) [in Japanese]
• Takeo Nakano
  "Particle transport process during sputter deposition process in the pressure range of 2-20 Pa"
  Sinku, 45 699-705 (2002) [in Japanese]
• Kenji Ohkawa, Takeo Nakano and Shigeru Baba
  "Evolution of the scaling of the surface roughness observed on sputtered copper films with atomic force microscope"
  Sinku, 45 134-137, (2002) [in Japanese]
• Takeo Nakano, Noriyuki Ohnuki and Shigeru Baba
  "Pressure dependence of optical emission from DC magnetron sputtering plasma observed with spatial resolution"
  Vacuum, 59 581-585 (2000)
• Shigeru Baba, Isao Mori and Takeo Nakano
  "Precise determination of the refractive index of sputtered MgO thin films in the visible light range"
  Vacuum, 59 531-537 (2000)
• T.Nakano and S.Baba
  "A hybrid simulation of high pressure sputtering, combining the Monte Carlo method and the diffusive approach"
  Thin Solid Filims, 343-344 24-26 (1999)
• S.Baba, T.Midorikawa, T.Nakano
  "Unambiguous detection of the adhesive failure of metal films in the microscratch test by waveform analysis of the friction signal"
  Appl. Surf. Sci., 144-145 344-349 (1999)
• T.Nakano and S.Baba
  "Simulation of particle transfer in high pressure sputtering"
  Vacuum, 51 485-489 (1998)
• T.Nakano, T.Suzuki, N.Ohnuki and S.Baba
  "Alloying and electrical properties of evaporated Cu-In bilayer thin films"
  Thin Solid Films, 334 192-195 (1998)
• K.Sakai, M.Takeshita, Y.Tanaka, T.Ue, M.Yanagisawa, M.Kosaka, T.Tsubomura, M.Ato and T.Nakano
  "A new one-dimensional platinum system consisting of carboxylate-bridged cis-diammineplatinum dimers"
  J. Am. Chem. Soc, 120 11353-11363 (1998)
• Y.Suzaki, A.Saitoh, T.Nakano and S.Baba
  "LEED observation of 4x1-In superstructure prepared on Si(111)-quasi-5x5-Cu surface"
  Appl. Surf. Sci., 113/114 445-447 (1997)
• T.Nakano, I.Mori and S.Baba
  "The effect of `warm' gas scattering on the deceleration of energetic atoms: Monte-Carlo study of the sputter-deposition of compounds"
  Appl. Surf. Sci., 113/114 642-646 (1997)
• T.Nakano and S.Baba
  "XPS measurement of the alloying process in sequentially evaporated Cu-In thin films"
  Sinku, 38 657-659, (1995) [in Japanese]
• A.Kinbara, T.Nakano, A.Kobayashi, S.Baba and T.Kajiwara
  "LaBx thin films prepared by magnetron sputtering"
  Appl. Surf. Sci., 70/71 742-745 (1993)
• T.Nakano, S.Baba, K.Sano, A.Kobayashi, A.Kinbara
  "Composition and physical properties of sputter-deposited LaBx thin films" Sinku, 35 245-247, (1992) [in Japanese]
  
• T.Nakano, S.Baba, A.Kobayashi and A.Kinbara, T.Kajiwara and K.Watanabe
  "Structure modification of radio frequency sputtered LaB6 thin films by internal stress"
  J. Vac. Sci. Technol. A, 9 547-549 (1991)
• T.Kajiwara, T.Urakabe, K.Sano, K.Fukuyama and K.Watanabe, S.Baba, T.Nakano, A.Kinbara
  "Mechanical and electrical properties of rf sputtered LaB6 thin films on glass substrates"
  Vacuum, 41 1224-1228 (1990)