slide No. 1 / 12

The primary goal of our study is to predict the thickness profile in the sputtering deposition. As you know, it is not so easy, because the particles sputtered out from the target are scattered by gas atoms, and change directions during the transfer.

Well, At first in this talk, I would like to introduce some concept about the particle transfer in sputtering deposition, and its treatment with Monte Carlo approach. I also mention the weak points of MC simulation at high pressures.

Secondly, I will speak about the treatment of diffusive stage of the particle transfer, and how to make it together with Monte Carlo results.

Thirdly, I mention some detail of the implementation. We would like to open our program sources to public, so I'm going to talk about the computing environment.

At last, some results of the new program are shown, and the talk will be summarized.